Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs

10.1109/LED.2005.859950

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Main Authors: Wang, X.P., Li, M.-F., Ren, C., Yu, X.F., Shen, C., Ma, H.H., Chin, A., Zhu, C.X., Ning, J., Yu, M.B., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/83224
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-832242024-11-15T08:17:59Z Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs Wang, X.P. Li, M.-F. Ren, C. Yu, X.F. Shen, C. Ma, H.H. Chin, A. Zhu, C.X. Ning, J. Yu, M.B. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING HfLaO High-κ dielectric Metal gate MOSFET 10.1109/LED.2005.859950 IEEE Electron Device Letters 27 1 31-33 EDLED 2014-10-07T04:38:45Z 2014-10-07T04:38:45Z 2006-01 Article Wang, X.P., Li, M.-F., Ren, C., Yu, X.F., Shen, C., Ma, H.H., Chin, A., Zhu, C.X., Ning, J., Yu, M.B., Kwong, D.-L. (2006-01). Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs. IEEE Electron Device Letters 27 (1) : 31-33. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2005.859950 07413106 http://scholarbank.nus.edu.sg/handle/10635/83224 000234397800011 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic HfLaO
High-κ dielectric
Metal gate
MOSFET
spellingShingle HfLaO
High-κ dielectric
Metal gate
MOSFET
Wang, X.P.
Li, M.-F.
Ren, C.
Yu, X.F.
Shen, C.
Ma, H.H.
Chin, A.
Zhu, C.X.
Ning, J.
Yu, M.B.
Kwong, D.-L.
Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs
description 10.1109/LED.2005.859950
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Wang, X.P.
Li, M.-F.
Ren, C.
Yu, X.F.
Shen, C.
Ma, H.H.
Chin, A.
Zhu, C.X.
Ning, J.
Yu, M.B.
Kwong, D.-L.
format Article
author Wang, X.P.
Li, M.-F.
Ren, C.
Yu, X.F.
Shen, C.
Ma, H.H.
Chin, A.
Zhu, C.X.
Ning, J.
Yu, M.B.
Kwong, D.-L.
author_sort Wang, X.P.
title Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs
title_short Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs
title_full Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs
title_fullStr Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs
title_full_unstemmed Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs
title_sort tuning effective metal gate work function by a novel gate dielectric hflao for nmosfets
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83224
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