Asymmetric energy distribution of interface traps in germanium MOSFETs with HfO2 gate dielectric

10.1149/1.2986766

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書目詳細資料
Main Authors: Xie, R., Wu, N., Shen, C., Zhu, C.
其他作者: ELECTRICAL & COMPUTER ENGINEERING
格式: Conference or Workshop Item
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/83500
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