Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack

Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack

10.1016/S0167-9317(01)00592-5

Saved in:
Bibliographic Details
Main Authors: Lee, P.S., Mangelinck, D., Pey, K.L., Ding, J., Chi, D.Z., Osipowicz, T., Dai, J.Y., See, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Layer inversion
LPCVD
Ni silicidation
Ni(Pt)Si
RTCVD
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83704
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-83704
record_format dspace
spelling sg-nus-scholar.10635-837042024-11-13T00:36:38Z Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack Lee, P.S. Mangelinck, D. Pey, K.L. Ding, J. Chi, D.Z. Osipowicz, T. Dai, J.Y. See, A. ELECTRICAL & COMPUTER ENGINEERING PHYSICS MATERIALS SCIENCE Layer inversion LPCVD Ni silicidation Ni(Pt)Si RTCVD 10.1016/S0167-9317(01)00592-5 Microelectronic Engineering 60 1-2 171-181 MIENE 2014-10-07T04:44:14Z 2014-10-07T04:44:14Z 2002-01 Conference Paper Lee, P.S., Mangelinck, D., Pey, K.L., Ding, J., Chi, D.Z., Osipowicz, T., Dai, J.Y., See, A. (2002-01). Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack. Microelectronic Engineering 60 (1-2) : 171-181. ScholarBank@NUS Repository. https://doi.org/10.1016/S0167-9317(01)00592-5 01679317 http://scholarbank.nus.edu.sg/handle/10635/83704 000173194900020 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Layer inversion
LPCVD
Ni silicidation
Ni(Pt)Si
RTCVD
spellingShingle Layer inversion
LPCVD
Ni silicidation
Ni(Pt)Si
RTCVD
Lee, P.S.
Mangelinck, D.
Pey, K.L.
Ding, J.
Chi, D.Z.
Osipowicz, T.
Dai, J.Y.
See, A.
Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack
description 10.1016/S0167-9317(01)00592-5
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Lee, P.S.
Mangelinck, D.
Pey, K.L.
Ding, J.
Chi, D.Z.
Osipowicz, T.
Dai, J.Y.
See, A.
format Conference or Workshop Item
author Lee, P.S.
Mangelinck, D.
Pey, K.L.
Ding, J.
Chi, D.Z.
Osipowicz, T.
Dai, J.Y.
See, A.
author_sort Lee, P.S.
title Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack
title_short Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack
title_full Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack
title_fullStr Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack
title_full_unstemmed Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack
title_sort enhanced stability of ni monosilicide on mosfets poly-si gate stack
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83704
_version_ 1821189666735390720

Similar Items