Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction

10.1109/SNW.2010.5562594

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Bibliographic Details
Main Authors:	Han, G., Yee, Y.S., Guo, P., Yang, Y., Fan, L., Zhan, C., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83706
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83706
record_format	dspace
spelling	sg-nus-scholar.10635-837062015-04-20T13:46:41Z Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction Han, G. Yee, Y.S. Guo, P. Yang, Y. Fan, L. Zhan, C. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/SNW.2010.5562594 2010 Silicon Nanoelectronics Workshop, SNW 2010 - 2014-10-07T04:44:16Z 2014-10-07T04:44:16Z 2010 Conference Paper Han, G.,Yee, Y.S.,Guo, P.,Yang, Y.,Fan, L.,Zhan, C.,Yeo, Y.-C. (2010). Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction. 2010 Silicon Nanoelectronics Workshop, SNW 2010 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/SNW.2010.5562594" target="_blank">https://doi.org/10.1109/SNW.2010.5562594</a> 9781424477272 http://scholarbank.nus.edu.sg/handle/10635/83706 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/SNW.2010.5562594
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Han, G. Yee, Y.S. Guo, P. Yang, Y. Fan, L. Zhan, C. Yeo, Y.-C.
format	Conference or Workshop Item
author	Han, G. Yee, Y.S. Guo, P. Yang, Y. Fan, L. Zhan, C. Yeo, Y.-C.
spellingShingle	Han, G. Yee, Y.S. Guo, P. Yang, Y. Fan, L. Zhan, C. Yeo, Y.-C. Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction
author_sort	Han, G.
title	Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction
title_short	Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction
title_full	Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction
title_fullStr	Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction
title_full_unstemmed	Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction
title_sort	enhancement of tfet performance using dopant profile-steepening implant and source dopant concentration engineering at tunneling junction
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83706
_version_	1681089485269368832

Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction

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