Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction

10.1109/SNW.2010.5562594

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書目詳細資料
Main Authors:	Han, G., Yee, Y.S., Guo, P., Yang, Y., Fan, L., Zhan, C., Yeo, Y.-C.
其他作者:	ELECTRICAL & COMPUTER ENGINEERING
格式:	Conference or Workshop Item
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/83706
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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