Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction
10.1109/SNW.2010.5562594
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| Main Authors: | , , , , , , |
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| 其他作者: | |
| 格式: | Conference or Workshop Item |
| 出版: |
2014
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| 在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/83706 |
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| 機構: | National University of Singapore |