High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference

10.1109/IEDM.2006.346859

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Bibliographic Details
Main Authors:	Wu, C.H., Hung, B.F., Chin, A., Wang, S.J., Chen, W.J., Wang, X.P., Li, M.-F., Zhu, C., Jin, Y., Tao, H.J., Chen, S.C., Liang, M.S.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83795
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83795
record_format	dspace
spelling	sg-nus-scholar.10635-837952015-01-06T21:02:03Z High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference Wu, C.H. Hung, B.F. Chin, A. Wang, S.J. Chen, W.J. Wang, X.P. Li, M.-F. Zhu, C. Jin, Y. Tao, H.J. Chen, S.C. Liang, M.S. ELECTRICAL & COMPUTER ENGINEERING 10.1109/IEDM.2006.346859 Technical Digest - International Electron Devices Meeting, IEDM - TDIMD 2014-10-07T04:45:17Z 2014-10-07T04:45:17Z 2006 Conference Paper Wu, C.H.,Hung, B.F.,Chin, A.,Wang, S.J.,Chen, W.J.,Wang, X.P.,Li, M.-F.,Zhu, C.,Jin, Y.,Tao, H.J.,Chen, S.C.,Liang, M.S. (2006). High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference. Technical Digest - International Electron Devices Meeting, IEDM : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IEDM.2006.346859" target="_blank">https://doi.org/10.1109/IEDM.2006.346859</a> 1424404398 01631918 http://scholarbank.nus.edu.sg/handle/10635/83795 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/IEDM.2006.346859
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wu, C.H. Hung, B.F. Chin, A. Wang, S.J. Chen, W.J. Wang, X.P. Li, M.-F. Zhu, C. Jin, Y. Tao, H.J. Chen, S.C. Liang, M.S.
format	Conference or Workshop Item
author	Wu, C.H. Hung, B.F. Chin, A. Wang, S.J. Chen, W.J. Wang, X.P. Li, M.-F. Zhu, C. Jin, Y. Tao, H.J. Chen, S.C. Liang, M.S.
spellingShingle	Wu, C.H. Hung, B.F. Chin, A. Wang, S.J. Chen, W.J. Wang, X.P. Li, M.-F. Zhu, C. Jin, Y. Tao, H.J. Chen, S.C. Liang, M.S. High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
author_sort	Wu, C.H.
title	High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
title_short	High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
title_full	High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
title_fullStr	High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
title_full_unstemmed	High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
title_sort	high temperature stable [ir3si-tan]/hflaon cmos with large work-function difference
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83795
_version_	1681089501659660288

High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference

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