High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference

• Main Authors: Wu, C.H., Hung, B.F., Chin, A., Wang, S.J., Chen, W.J., Wang, X.P., Li, M.-F., Zhu, C., Jin, Y., Tao, H.J., Chen, S.C., Liang, M.S.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83795
• Institution: National University of Singapore

10.1109/IEDM.2006.346859