Laminated metal gate electrode with tunable work function for advanced CMOS

Laminated metal gate electrode with tunable work function for advanced CMOS

Digest of Technical Papers - Symposium on VLSI Technology

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Bibliographic Details
Main Authors: Bae, S.H., Bai, W.P., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83880
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Institution: National University of Singapore
Description
Summary:Digest of Technical Papers - Symposium on VLSI Technology

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