Laminated metal gate electrode with tunable work function for advanced CMOS
Digest of Technical Papers - Symposium on VLSI Technology
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Main Authors: | Bae, S.H., Bai, W.P., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.L. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83880 |
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Institution: | National University of Singapore |
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