Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress

10.1109/ISDRS.2009.5378197

محفوظ في:
التفاصيل البيبلوغرافية
المؤلفون الرئيسيون: Chin, H.-C., Gong, X., Guo, H., Zhou, Q., Koh, S.-M., Lee, H.K., Shi, L., Yeo, Y.-C.
مؤلفون آخرون: ELECTRICAL & COMPUTER ENGINEERING
التنسيق: Conference or Workshop Item
منشور في: 2014
الوصول للمادة أونلاين:http://scholarbank.nus.edu.sg/handle/10635/84073
الوسوم: إضافة وسم
لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!
id sg-nus-scholar.10635-84073
record_format dspace
spelling sg-nus-scholar.10635-840732024-11-10T04:42:38Z Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress Chin, H.-C. Gong, X. Guo, H. Zhou, Q. Koh, S.-M. Lee, H.K. Shi, L. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ISDRS.2009.5378197 2009 International Semiconductor Device Research Symposium, ISDRS '09 - 2014-10-07T04:48:29Z 2014-10-07T04:48:29Z 2009 Conference Paper Chin, H.-C.,Gong, X.,Guo, H.,Zhou, Q.,Koh, S.-M.,Lee, H.K.,Shi, L.,Yeo, Y.-C. (2009). Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress. 2009 International Semiconductor Device Research Symposium, ISDRS '09 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ISDRS.2009.5378197" target="_blank">https://doi.org/10.1109/ISDRS.2009.5378197</a> 9781424460304 http://scholarbank.nus.edu.sg/handle/10635/84073 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1109/ISDRS.2009.5378197
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Chin, H.-C.
Gong, X.
Guo, H.
Zhou, Q.
Koh, S.-M.
Lee, H.K.
Shi, L.
Yeo, Y.-C.
format Conference or Workshop Item
author Chin, H.-C.
Gong, X.
Guo, H.
Zhou, Q.
Koh, S.-M.
Lee, H.K.
Shi, L.
Yeo, Y.-C.
spellingShingle Chin, H.-C.
Gong, X.
Guo, H.
Zhou, Q.
Koh, S.-M.
Lee, H.K.
Shi, L.
Yeo, Y.-C.
Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress
author_sort Chin, H.-C.
title Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress
title_short Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress
title_full Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress
title_fullStr Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress
title_full_unstemmed Performance boost for In0.53Ga0.47As channel N-MOSFET using silicon nitride liner stressor with high tensile stress
title_sort performance boost for in0.53ga0.47as channel n-mosfet using silicon nitride liner stressor with high tensile stress
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84073
_version_ 1821218150707888128