Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height

10.1109/ISDRS.2011.6135352

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Bibliographic Details
Main Authors:	Lim, P.S.Y., Zhou, Q., Chi, D., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84178
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-84178
record_format	dspace
spelling	sg-nus-scholar.10635-841782015-01-12T18:14:31Z Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height Lim, P.S.Y. Zhou, Q. Chi, D. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ISDRS.2011.6135352 2011 International Semiconductor Device Research Symposium, ISDRS 2011 - 2014-10-07T04:49:42Z 2014-10-07T04:49:42Z 2011 Conference Paper Lim, P.S.Y.,Zhou, Q.,Chi, D.,Yeo, Y.-C. (2011). Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height. 2011 International Semiconductor Device Research Symposium, ISDRS 2011 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ISDRS.2011.6135352" target="_blank">https://doi.org/10.1109/ISDRS.2011.6135352</a> 9781457717550 http://scholarbank.nus.edu.sg/handle/10635/84178 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/ISDRS.2011.6135352
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Lim, P.S.Y. Zhou, Q. Chi, D. Yeo, Y.-C.
format	Conference or Workshop Item
author	Lim, P.S.Y. Zhou, Q. Chi, D. Yeo, Y.-C.
spellingShingle	Lim, P.S.Y. Zhou, Q. Chi, D. Yeo, Y.-C. Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height
author_sort	Lim, P.S.Y.
title	Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height
title_short	Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height
title_full	Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height
title_fullStr	Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height
title_full_unstemmed	Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height
title_sort	silicidation using nickel and dysprosium stack on si(100): nisi 2 formation and impact on schottky barrier height
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/84178
_version_	1681089571036594176

Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height

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