Silicidation using nickel and Dysprosium stack on Si(100): NiSi 2 formation and impact on Schottky Barrier Height

• Main Authors: Lim, P.S.Y., Zhou, Q., Chi, D., Yeo, Y.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/84178
• Institution: National University of Singapore

10.1109/ISDRS.2011.6135352