Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature

International Journal of Modern Physics B

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Bibliographic Details
Main Authors:	Liu, L., Gong, H., Wang, Y., Wee, A.T.S., Liu, R.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84185
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-84185
record_format	dspace
spelling	sg-nus-scholar.10635-841852015-01-08T04:01:06Z Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature Liu, L. Gong, H. Wang, Y. Wee, A.T.S. Liu, R. ELECTRICAL & COMPUTER ENGINEERING MATERIALS SCIENCE INSTITUTE OF ENGINEERING SCIENCE PHYSICS International Journal of Modern Physics B 16 1-2 322-327 IJPBE 2014-10-07T04:49:47Z 2014-10-07T04:49:47Z 2002-01-20 Conference Paper Liu, L.,Gong, H.,Wang, Y.,Wee, A.T.S.,Liu, R. (2002-01-20). Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature. International Journal of Modern Physics B 16 (1-2) : 322-327. ScholarBank@NUS Repository. 02179792 http://scholarbank.nus.edu.sg/handle/10635/84185 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	International Journal of Modern Physics B
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Liu, L. Gong, H. Wang, Y. Wee, A.T.S. Liu, R.
format	Conference or Workshop Item
author	Liu, L. Gong, H. Wang, Y. Wee, A.T.S. Liu, R.
spellingShingle	Liu, L. Gong, H. Wang, Y. Wee, A.T.S. Liu, R. Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature
author_sort	Liu, L.
title	Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature
title_short	Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature
title_full	Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature
title_fullStr	Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature
title_full_unstemmed	Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature
title_sort	sims depth profiling analysis of cu/ta/sio2 interfacial diffusion at different annealing temperature
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/84185
_version_	1681089572317954048

Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature

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