Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact

10.1149/05302.0065ecst

Saved in:
Bibliographic Details
Main Authors: Bera, M.K., Liu, Y., Kyaw, L.M., Ngoo, Y.J., Chor, E.F.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84303
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-84303
record_format dspace
spelling sg-nus-scholar.10635-843032023-10-29T23:17:55Z Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact Bera, M.K. Liu, Y. Kyaw, L.M. Ngoo, Y.J. Chor, E.F. ELECTRICAL & COMPUTER ENGINEERING 10.1149/05302.0065ecst ECS Transactions 53 2 65-74 2014-10-07T04:51:08Z 2014-10-07T04:51:08Z 2013 Conference Paper Bera, M.K., Liu, Y., Kyaw, L.M., Ngoo, Y.J., Chor, E.F. (2013). Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact. ECS Transactions 53 (2) : 65-74. ScholarBank@NUS Repository. https://doi.org/10.1149/05302.0065ecst 9781607683759 19385862 http://scholarbank.nus.edu.sg/handle/10635/84303 000338950500009 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1149/05302.0065ecst
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Bera, M.K.
Liu, Y.
Kyaw, L.M.
Ngoo, Y.J.
Chor, E.F.
format Conference or Workshop Item
author Bera, M.K.
Liu, Y.
Kyaw, L.M.
Ngoo, Y.J.
Chor, E.F.
spellingShingle Bera, M.K.
Liu, Y.
Kyaw, L.M.
Ngoo, Y.J.
Chor, E.F.
Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact
author_sort Bera, M.K.
title Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact
title_short Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact
title_full Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact
title_fullStr Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact
title_full_unstemmed Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact
title_sort thickness dependent electrical characteristics of inaln/gan-on-si moshemts with y2o3 gate dielectric and au-free ohmic contact
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84303
_version_ 1781784440789270528