Thickness dependent electrical characteristics of InAlN/GaN-on-Si MOSHEMTs with Y2O3 gate dielectric and Au-free ohmic contact
10.1149/05302.0065ecst
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Main Authors: | Bera, M.K., Liu, Y., Kyaw, L.M., Ngoo, Y.J., Chor, E.F. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84303 |
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Institution: | National University of Singapore |
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