Wafer-scale, highly-ordered silicon nanowires produced by step-and-flash imprint lithography and metal-assisted chemical etching

Wafer-scale, highly-ordered silicon nanowires produced by step-and-flash imprint lithography and metal-assisted chemical etching

10.1557/opl.2012.1663

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Bibliographic Details
Main Authors: Ho, J.-W., Wee, Q., Dumond, J., Zhang, L., Zang, K., Choi, W.K., Tay, A.A.O., Chua, S.-J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84360
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Institution: National University of Singapore
Description
Summary:10.1557/opl.2012.1663

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