Wafer-scale, highly-ordered silicon nanowires produced by step-and-flash imprint lithography and metal-assisted chemical etching

• Main Authors: Ho, J.-W., Wee, Q., Dumond, J., Zhang, L., Zang, K., Choi, W.K., Tay, A.A.O., Chua, S.-J.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/84360
• Institution: National University of Singapore

10.1557/opl.2012.1663