Wafer-scale, highly-ordered silicon nanowires produced by step-and-flash imprint lithography and metal-assisted chemical etching
10.1557/opl.2012.1663
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Main Authors: | Ho, J.-W., Wee, Q., Dumond, J., Zhang, L., Zang, K., Choi, W.K., Tay, A.A.O., Chua, S.-J. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84360 |
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Institution: | National University of Singapore |
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