Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms

IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE

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Bibliographic Details
Main Authors:	Ng, T.H., Koh, B.H., Chim, W.K., Choi, W.K., Zheng, J.X., Tung, C.H., Du, A.Y.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Frenkel-poole (F-P) emission Metal-insulator-semiconductor (MIS) Schottky emission Zirconium dioxide
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84368
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-84368
record_format	dspace
spelling	sg-nus-scholar.10635-843682015-01-08T19:48:21Z Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms Ng, T.H. Koh, B.H. Chim, W.K. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y. ELECTRICAL & COMPUTER ENGINEERING Frenkel-poole (F-P) emission Metal-insulator-semiconductor (MIS) Schottky emission Zirconium dioxide IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE 130-134 2014-10-07T04:51:53Z 2014-10-07T04:51:53Z 2002 Conference Paper Ng, T.H.,Koh, B.H.,Chim, W.K.,Choi, W.K.,Zheng, J.X.,Tung, C.H.,Du, A.Y. (2002). Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms. IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE : 130-134. ScholarBank@NUS Repository. 0780375785 http://scholarbank.nus.edu.sg/handle/10635/84368 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Frenkel-poole (F-P) emission Metal-insulator-semiconductor (MIS) Schottky emission Zirconium dioxide
spellingShingle	Frenkel-poole (F-P) emission Metal-insulator-semiconductor (MIS) Schottky emission Zirconium dioxide Ng, T.H. Koh, B.H. Chim, W.K. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y. Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
description	IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ng, T.H. Koh, B.H. Chim, W.K. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y.
format	Conference or Workshop Item
author	Ng, T.H. Koh, B.H. Chim, W.K. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y.
author_sort	Ng, T.H.
title	Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
title_short	Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
title_full	Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
title_fullStr	Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
title_full_unstemmed	Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
title_sort	zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/84368
_version_	1681089605685739520

Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms

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