Zirconium dioxide as a gate dielectric in metal-insulator-silicon structures and current transport mechanisms
IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
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Main Authors: | Ng, T.H., Koh, B.H., Chim, W.K., Choi, W.K., Zheng, J.X., Tung, C.H., Du, A.Y. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84368 |
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Institution: | National University of Singapore |
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