Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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| Main Authors: | , , , |
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| 格式: | Article |
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2014
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| 在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/85295 |
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| 機構: | National University of Singapore |