The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide

10.1109/LED.2003.812553

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Bibliographic Details
Main Authors:	Lin, W.H., Pey, K.L., Dong, Z., Chooi, S.Y.M., Ang, C.H., Zheng, J.Z.
Other Authors:	CHEMICAL & ENVIRONMENTAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/92430
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-92430
record_format	dspace
spelling	sg-nus-scholar.10635-924302024-11-11T14:21:41Z The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z. CHEMICAL & ENVIRONMENTAL ENGINEERING ELECTRICAL & COMPUTER ENGINEERING Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution 10.1109/LED.2003.812553 IEEE Electron Device Letters 24 5 336-338 EDLED 2014-10-09T10:02:44Z 2014-10-09T10:02:44Z 2003-05 Article Lin, W.H., Pey, K.L., Dong, Z., Chooi, S.Y.M., Ang, C.H., Zheng, J.Z. (2003-05). The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide. IEEE Electron Device Letters 24 (5) : 336-338. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2003.812553 07413106 http://scholarbank.nus.edu.sg/handle/10635/92430 000184064600017 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution
spellingShingle	Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z. The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
description	10.1109/LED.2003.812553
author2	CHEMICAL & ENVIRONMENTAL ENGINEERING
author_facet	CHEMICAL & ENVIRONMENTAL ENGINEERING Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z.
format	Article
author	Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z.
author_sort	Lin, W.H.
title	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_short	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_full	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_fullStr	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_full_unstemmed	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_sort	statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/92430
_version_	1821222091715772416

The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide

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