The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide

The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide

10.1109/LED.2003.812553

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Bibliographic Details
Main Authors: Lin, W.H., Pey, K.L., Dong, Z., Chooi, S.Y.M., Ang, C.H., Zheng, J.Z.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Percolation path
Soft breakdown
Ultrathin gate oxide
Weibull distribution
Online Access:http://scholarbank.nus.edu.sg/handle/10635/92430
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/92430

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