Improvement on lithography pattern profile by plasma treatment

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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Bibliographic Details
Main Authors:	Soo, C.P., Bourdillon, A.J., Valiyaveettil, S., Huan, A., Wee, A., Fan, M.H., Ang, T.C., Chan, L.H.
Other Authors:	MATERIALS SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/94011
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-94011
record_format	dspace
spelling	sg-nus-scholar.10635-940112015-02-23T08:33:39Z Improvement on lithography pattern profile by plasma treatment Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H. MATERIALS SCIENCE PHYSICS CHEMISTRY Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 4 1526-1530 JVTAD 2014-10-16T08:31:03Z 2014-10-16T08:31:03Z 1999-07 Article Soo, C.P.,Bourdillon, A.J.,Valiyaveettil, S.,Huan, A.,Wee, A.,Fan, M.H.,Ang, T.C.,Chan, L.H. (1999-07). Improvement on lithography pattern profile by plasma treatment. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) : 1526-1530. ScholarBank@NUS Repository. 07342101 http://scholarbank.nus.edu.sg/handle/10635/94011 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
author2	MATERIALS SCIENCE
author_facet	MATERIALS SCIENCE Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H.
format	Article
author	Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H.
spellingShingle	Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H. Improvement on lithography pattern profile by plasma treatment
author_sort	Soo, C.P.
title	Improvement on lithography pattern profile by plasma treatment
title_short	Improvement on lithography pattern profile by plasma treatment
title_full	Improvement on lithography pattern profile by plasma treatment
title_fullStr	Improvement on lithography pattern profile by plasma treatment
title_full_unstemmed	Improvement on lithography pattern profile by plasma treatment
title_sort	improvement on lithography pattern profile by plasma treatment
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/94011
_version_	1681091221039087616

Improvement on lithography pattern profile by plasma treatment

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