Improvement on lithography pattern profile by plasma treatment
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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sg-nus-scholar.10635-940112024-11-12T21:15:44Z Improvement on lithography pattern profile by plasma treatment Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H. PHYSICS MATERIALS SCIENCE CHEMISTRY Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 4 1526-1530 JVTAD 2014-10-16T08:31:03Z 2014-10-16T08:31:03Z 1999-07 Article Soo, C.P.,Bourdillon, A.J.,Valiyaveettil, S.,Huan, A.,Wee, A.,Fan, M.H.,Ang, T.C.,Chan, L.H. (1999-07). Improvement on lithography pattern profile by plasma treatment. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) : 1526-1530. ScholarBank@NUS Repository. 07342101 http://scholarbank.nus.edu.sg/handle/10635/94011 NOT_IN_WOS Scopus |
| institution |
National University of Singapore |
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NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
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ScholarBank@NUS |
| description |
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H. |
| format |
Article |
| author |
Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H. |
| spellingShingle |
Soo, C.P. Bourdillon, A.J. Valiyaveettil, S. Huan, A. Wee, A. Fan, M.H. Ang, T.C. Chan, L.H. Improvement on lithography pattern profile by plasma treatment |
| author_sort |
Soo, C.P. |
| title |
Improvement on lithography pattern profile by plasma treatment |
| title_short |
Improvement on lithography pattern profile by plasma treatment |
| title_full |
Improvement on lithography pattern profile by plasma treatment |
| title_fullStr |
Improvement on lithography pattern profile by plasma treatment |
| title_full_unstemmed |
Improvement on lithography pattern profile by plasma treatment |
| title_sort |
improvement on lithography pattern profile by plasma treatment |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/94011 |
| _version_ |
1821186359535075328 |