Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure
10.1023/A:1012590305144
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2014
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sg-nus-scholar.10635-960312015-02-17T15:12:23Z Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure Latt, K.M. Sher-Yi, C. Osipowicz, T. Lee, K. Lee, Y.K. PHYSICS 10.1023/A:1012590305144 Journal of Materials Science 36 23 5705-5712 JMTSA 2014-10-16T09:18:41Z 2014-10-16T09:18:41Z 2001-12-01 Article Latt, K.M.,Sher-Yi, C.,Osipowicz, T.,Lee, K.,Lee, Y.K. (2001-12-01). Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure. Journal of Materials Science 36 (23) : 5705-5712. ScholarBank@NUS Repository. <a href="https://doi.org/10.1023/A:1012590305144" target="_blank">https://doi.org/10.1023/A:1012590305144</a> 00222461 http://scholarbank.nus.edu.sg/handle/10635/96031 NOT_IN_WOS Scopus |
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National University of Singapore |
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Singapore |
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ScholarBank@NUS |
| description |
10.1023/A:1012590305144 |
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PHYSICS |
| author_facet |
PHYSICS Latt, K.M. Sher-Yi, C. Osipowicz, T. Lee, K. Lee, Y.K. |
| format |
Article |
| author |
Latt, K.M. Sher-Yi, C. Osipowicz, T. Lee, K. Lee, Y.K. |
| spellingShingle |
Latt, K.M. Sher-Yi, C. Osipowicz, T. Lee, K. Lee, Y.K. Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure |
| author_sort |
Latt, K.M. |
| title |
Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure |
| title_short |
Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure |
| title_full |
Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure |
| title_fullStr |
Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure |
| title_full_unstemmed |
Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure |
| title_sort |
comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the cu/tan/sio2/si multilayer structure |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/96031 |
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1681091585830289408 |