Dopant distribution in the recrystallization transient at the maximum melt depth induced by laser annealing

10.1063/1.2364834

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Bibliographic Details
Main Authors: Ong, K.K., Pey, K.L., Lee, P.S., Wee, A.T.S., Wang, X.C., Chong, Y.F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96264
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Institution: National University of Singapore

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