Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices

10.1109/TED.2004.826866

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Bibliographic Details
Main Authors:	Chong, Y.F., Gossmann, H.-J.L., Pey, K.-L., Thompson, M.O., Wee, A.T.S., Tung, C.H.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	Boron penetration Gate oxide reliability Laser thermal processing (LTP) Poly-depletion
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/97046
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-97046
record_format	dspace
spelling	sg-nus-scholar.10635-970462024-11-12T21:17:55Z Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices Chong, Y.F. Gossmann, H.-J.L. Pey, K.-L. Thompson, M.O. Wee, A.T.S. Tung, C.H. PHYSICS Boron penetration Gate oxide reliability Laser thermal processing (LTP) Poly-depletion 10.1109/TED.2004.826866 IEEE Transactions on Electron Devices 51 5 669-676 IETDA 2014-10-16T09:30:38Z 2014-10-16T09:30:38Z 2004-05 Article Chong, Y.F., Gossmann, H.-J.L., Pey, K.-L., Thompson, M.O., Wee, A.T.S., Tung, C.H. (2004-05). Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices. IEEE Transactions on Electron Devices 51 (5) : 669-676. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2004.826866 00189383 http://scholarbank.nus.edu.sg/handle/10635/97046 000221117300004 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Boron penetration Gate oxide reliability Laser thermal processing (LTP) Poly-depletion
spellingShingle	Boron penetration Gate oxide reliability Laser thermal processing (LTP) Poly-depletion Chong, Y.F. Gossmann, H.-J.L. Pey, K.-L. Thompson, M.O. Wee, A.T.S. Tung, C.H. Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices
description	10.1109/TED.2004.826866
author2	PHYSICS
author_facet	PHYSICS Chong, Y.F. Gossmann, H.-J.L. Pey, K.-L. Thompson, M.O. Wee, A.T.S. Tung, C.H.
format	Article
author	Chong, Y.F. Gossmann, H.-J.L. Pey, K.-L. Thompson, M.O. Wee, A.T.S. Tung, C.H.
author_sort	Chong, Y.F.
title	Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices
title_short	Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices
title_full	Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices
title_fullStr	Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices
title_full_unstemmed	Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices
title_sort	laser thermal processing of amorphous silicon gates to reduce poly-depletion in cmos devices
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/97046
_version_	1821210254018347008

Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices

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