Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure

10.1016/S1369-8001(00)00031-7

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Main Authors: Lee, Y.K., Latt, K.M., Osipowicz, T., Sher-Yi, C.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98085
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-980852023-10-29T22:23:09Z Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure Lee, Y.K. Latt, K.M. Osipowicz, T. Sher-Yi, C. PHYSICS 10.1016/S1369-8001(00)00031-7 Materials Science in Semiconductor Processing 3 3 191-194 MSSPF 2014-10-16T09:42:48Z 2014-10-16T09:42:48Z 2000-06 Article Lee, Y.K., Latt, K.M., Osipowicz, T., Sher-Yi, C. (2000-06). Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure. Materials Science in Semiconductor Processing 3 (3) : 191-194. ScholarBank@NUS Repository. https://doi.org/10.1016/S1369-8001(00)00031-7 13698001 http://scholarbank.nus.edu.sg/handle/10635/98085 000165549600005 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1016/S1369-8001(00)00031-7
author2 PHYSICS
author_facet PHYSICS
Lee, Y.K.
Latt, K.M.
Osipowicz, T.
Sher-Yi, C.
format Article
author Lee, Y.K.
Latt, K.M.
Osipowicz, T.
Sher-Yi, C.
spellingShingle Lee, Y.K.
Latt, K.M.
Osipowicz, T.
Sher-Yi, C.
Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
author_sort Lee, Y.K.
title Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
title_short Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
title_full Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
title_fullStr Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
title_full_unstemmed Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
title_sort study of diffusion barrier properties of ternary alloy (tixalynz) in cu/tixalynz/sio2/si thin film structure
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/98085
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