Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
10.1016/S1369-8001(00)00031-7
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Main Authors: | Lee, Y.K., Latt, K.M., Osipowicz, T., Sher-Yi, C. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/98085 |
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Institution: | National University of Singapore |
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