Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure

10.1016/S1369-8001(00)00031-7

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Bibliographic Details
Main Authors: Lee, Y.K., Latt, K.M., Osipowicz, T., Sher-Yi, C.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98085
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Institution: National University of Singapore

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