Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides

Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides

10.1063/1.1719267

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Bibliographic Details
Main Authors: Chong, Y.F., Gossmann, H.-J.L., Thompson, M.O., Yang, S., Pey, K.L., Wee, A.T.S.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98413
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Institution: National University of Singapore
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Summary:10.1063/1.1719267

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