Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides

10.1063/1.1719267

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Main Authors: Chong, Y.F., Gossmann, H.-J.L., Thompson, M.O., Yang, S., Pey, K.L., Wee, A.T.S.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98413
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-984132023-10-25T22:31:00Z Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides Chong, Y.F. Gossmann, H.-J.L. Thompson, M.O. Yang, S. Pey, K.L. Wee, A.T.S. PHYSICS 10.1063/1.1719267 Journal of Applied Physics 95 11 I 6048-6053 JAPIA 2014-10-16T09:46:48Z 2014-10-16T09:46:48Z 2004-06-01 Article Chong, Y.F., Gossmann, H.-J.L., Thompson, M.O., Yang, S., Pey, K.L., Wee, A.T.S. (2004-06-01). Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides. Journal of Applied Physics 95 (11 I) : 6048-6053. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1719267 00218979 http://scholarbank.nus.edu.sg/handle/10635/98413 000221657300013 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.1719267
author2 PHYSICS
author_facet PHYSICS
Chong, Y.F.
Gossmann, H.-J.L.
Thompson, M.O.
Yang, S.
Pey, K.L.
Wee, A.T.S.
format Article
author Chong, Y.F.
Gossmann, H.-J.L.
Thompson, M.O.
Yang, S.
Pey, K.L.
Wee, A.T.S.
spellingShingle Chong, Y.F.
Gossmann, H.-J.L.
Thompson, M.O.
Yang, S.
Pey, K.L.
Wee, A.T.S.
Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
author_sort Chong, Y.F.
title Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
title_short Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
title_full Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
title_fullStr Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
title_full_unstemmed Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
title_sort time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/98413
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