Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
10.1063/1.1719267
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sg-nus-scholar.10635-984132023-10-25T22:31:00Z Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides Chong, Y.F. Gossmann, H.-J.L. Thompson, M.O. Yang, S. Pey, K.L. Wee, A.T.S. PHYSICS 10.1063/1.1719267 Journal of Applied Physics 95 11 I 6048-6053 JAPIA 2014-10-16T09:46:48Z 2014-10-16T09:46:48Z 2004-06-01 Article Chong, Y.F., Gossmann, H.-J.L., Thompson, M.O., Yang, S., Pey, K.L., Wee, A.T.S. (2004-06-01). Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides. Journal of Applied Physics 95 (11 I) : 6048-6053. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1719267 00218979 http://scholarbank.nus.edu.sg/handle/10635/98413 000221657300013 Scopus |
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PHYSICS Chong, Y.F. Gossmann, H.-J.L. Thompson, M.O. Yang, S. Pey, K.L. Wee, A.T.S. |
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Chong, Y.F. Gossmann, H.-J.L. Thompson, M.O. Yang, S. Pey, K.L. Wee, A.T.S. |
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Chong, Y.F. Gossmann, H.-J.L. Thompson, M.O. Yang, S. Pey, K.L. Wee, A.T.S. Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides |
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Chong, Y.F. |
title |
Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides |
title_short |
Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides |
title_full |
Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides |
title_fullStr |
Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides |
title_full_unstemmed |
Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides |
title_sort |
time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/98413 |
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1781786868694646784 |