Effects of focused MeV ion beam irradiation on the roughness of electrochemically micromachined silicon surfaces
10.1116/1.3406130
Saved in:
Main Authors: | Ow, Y.S., Azimi, S., Breese, M.B.H., Teo, E.J., Mangaiyarkarasi, D. |
---|---|
Other Authors: | PHYSICS |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/98685 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
On the dependence of the surface roughness of electrochemically anodized silicon on ion irradiation fluence
by: Azimi, S., et al.
Published: (2014) -
An automatic beam focusing system for MeV protons
by: Udalagama, C.N.B., et al.
Published: (2014) -
Focusing of MeV ion beams by means of tapered glass capillary optics
by: Nebiki, T., et al.
Published: (2014) -
Controlled intensity emission from patterned porous silicon using focused proton beam irradiation
by: Teo, E.J., et al.
Published: (2014) -
Controlled shift in emission wavelength from patterned porous silicon using focused ion beam irradiation
by: Mangaiyarkarasi, D., et al.
Published: (2014)