Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

• المؤلفون الرئيسيون: Gorelick S., Puttaraksa N., Sajavaara T., Laitinen M., Singkarat S., Whitlow H.J.
• التنسيق: مقال
• اللغة: English
• منشور في: 2014
• الوصول للمادة أونلاين: http://www.scopus.com/inward/record.url?eid=2-s2.0-44449134554&partnerID=40&md5=6fe3d1a57fd1c2f717633f38d40e4b5b; http://cmuir.cmu.ac.th/handle/6653943832/5578

MeV ion beam lithography is a direct writing technique capable of producing microfluidic patterns and lab-on-chip devices with straight walls in thick resist films. In this technique a small beam spot of MeV ions is scanned over the resist surface to generate a latent image of the pattern. The micro...