Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)
MeV ion beam lithography is a direct writing technique capable of producing microfluidic patterns and lab-on-chip devices with straight walls in thick resist films. In this technique a small beam spot of MeV ions is scanned over the resist surface to generate a latent image of the pattern. The micro...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2014
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| Online Access: | http://www.scopus.com/inward/record.url?eid=2-s2.0-44449134554&partnerID=40&md5=6fe3d1a57fd1c2f717633f38d40e4b5b http://cmuir.cmu.ac.th/handle/6653943832/5578 |
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| Institution: | Chiang Mai University |
| Language: | English |