Effectiveness of reservoir length on electromigration lifetime enhancement for ULSI interconnects with advanced technology nodes

Reservoir length in ULSI interconnections can enhance their electromigration lifetime. As low-K dielectric is employed in current technology node, and line current density and temperature increase as we advanced in technology node, we investigate the impact of the above-mentioned on the effectivenes...

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Bibliographic Details
Main Authors: Tan, Cher Ming, Fu, Chunmiao
Other Authors: School of Electrical and Electronic Engineering
Format: Conference or Workshop Item
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/101087
http://hdl.handle.net/10220/16310
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Institution: Nanyang Technological University
Language: English