Antireflective GaN nanoridge texturing by metal-assisted chemical etching via a thermally dewetted Pt catalyst network for highly responsive ultraviolet photodiodes

Antireflective GaN nanoridge texturing by metal-assisted chemical etching via a thermally dewetted Pt catalyst network for highly responsive ultraviolet photodiodes

Antireflective (AR) surface texturing is a feasible way to boost the light absorption of photosensitive materials and devices. As a plasma-free etching method, metal-assisted chemical etching (MacEtch) has been employed for fabricating GaN AR surface texturing. However, the poor etching efficiency o...

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書目詳細資料
Main Authors:	Liao, Yikai, Kim, You Jin, Lai, Junyu, Seo, Jung-Hun, Kim, Munho
其他作者:	School of Electrical and Electronic Engineering
格式:	Article
語言:	English
出版:	2023
主題:	Engineering::Electrical and electronic engineering Antireflection Gallium Nitride
在線閱讀:	https://hdl.handle.net/10356/165824
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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