Particle reduction of novellus PEP3510 photo resist stripper
The objective of this project is to resolve defect density issues of the Novellus Photo Resist Strip to reduce wafer scrape and improve yield for Chartered Silicon Partners, Fab 6, CHRT. The engineers will be able to use the resolution of the findings and implement across all Novellus Photo Resist S...
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4979 |
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| Institution: | Nanyang Technological University |
| Summary: | The objective of this project is to resolve defect density issues of the Novellus Photo Resist Strip to reduce wafer scrape and improve yield for Chartered Silicon Partners, Fab 6, CHRT. The engineers will be able to use the resolution of the findings and implement across all Novellus Photo Resist Strippers. This includes identifying root cause of the problem, current design limitations, area of improvement, feasibility of new designs and implementation of new design and control method of the new design. |
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