Particle reduction of novellus PEP3510 photo resist stripper

• Main Author: Chai, Koh Chin
• Other Authors: Ahn Jaeshin
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
• Online Access: http://hdl.handle.net/10356/4979
• Institution: Nanyang Technological University

The objective of this project is to resolve defect density issues of the Novellus Photo Resist Strip to reduce wafer scrape and improve yield for Chartered Silicon Partners, Fab 6, CHRT. The engineers will be able to use the resolution of the findings and implement across all Novellus Photo Resist S...