Particle reduction of novellus PEP3510 photo resist stripper

Particle reduction of novellus PEP3510 photo resist stripper

The objective of this project is to resolve defect density issues of the Novellus Photo Resist Strip to reduce wafer scrape and improve yield for Chartered Silicon Partners, Fab 6, CHRT. The engineers will be able to use the resolution of the findings and implement across all Novellus Photo Resist S...

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Main Author: Chai, Koh Chin
Other Authors: Ahn Jaeshin
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
Online Access:http://hdl.handle.net/10356/4979
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Institution: Nanyang Technological University
id sg-ntu-dr.10356-4979
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spelling sg-ntu-dr.10356-49792023-07-04T15:19:39Z Particle reduction of novellus PEP3510 photo resist stripper Chai, Koh Chin Ahn Jaeshin School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging The objective of this project is to resolve defect density issues of the Novellus Photo Resist Strip to reduce wafer scrape and improve yield for Chartered Silicon Partners, Fab 6, CHRT. The engineers will be able to use the resolution of the findings and implement across all Novellus Photo Resist Strippers. This includes identifying root cause of the problem, current design limitations, area of improvement, feasibility of new designs and implementation of new design and control method of the new design. Master of Science (Microelectronics) 2008-09-17T10:02:37Z 2008-09-17T10:02:37Z 2005 2005 Thesis http://hdl.handle.net/10356/4979 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
Chai, Koh Chin
Particle reduction of novellus PEP3510 photo resist stripper
description The objective of this project is to resolve defect density issues of the Novellus Photo Resist Strip to reduce wafer scrape and improve yield for Chartered Silicon Partners, Fab 6, CHRT. The engineers will be able to use the resolution of the findings and implement across all Novellus Photo Resist Strippers. This includes identifying root cause of the problem, current design limitations, area of improvement, feasibility of new designs and implementation of new design and control method of the new design.
author2 Ahn Jaeshin
author_facet Ahn Jaeshin
Chai, Koh Chin
format Theses and Dissertations
author Chai, Koh Chin
author_sort Chai, Koh Chin
title Particle reduction of novellus PEP3510 photo resist stripper
title_short Particle reduction of novellus PEP3510 photo resist stripper
title_full Particle reduction of novellus PEP3510 photo resist stripper
title_fullStr Particle reduction of novellus PEP3510 photo resist stripper
title_full_unstemmed Particle reduction of novellus PEP3510 photo resist stripper
title_sort particle reduction of novellus pep3510 photo resist stripper
publishDate 2008
url http://hdl.handle.net/10356/4979
_version_ 1772829132426575872

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