Nanoscale characterization of metal/dielectric/semiconductor interfaces using ballistic electron emission microscopy

Ballistic electron emission microscopy (BEEM) was employed to study metal/dielectric/semiconductor devices with high spatial resolution. A comprehensive study of the subthreshold characteristics of the BEEM spectra shows that the BEEM current in the subthreshold region decreases at a rate of ~60 mV/...

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Bibliographic Details
Main Author: Qin, Hailang
Other Authors: Cedric Troadec
Format: Theses and Dissertations
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/50608
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Institution: Nanyang Technological University
Language: English

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