Computational analysis and chemical mechanical polishing for manufacturing of optical components
High precision optical components are required for modern life and future. To achieve component’s surfaces with high quality, chemical mechanical polishing (CMP) is required. It is a unique method to obtain the global uniformity planarization across the surface without scratches. In the polishing of...
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2017
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| Online Access: | http://hdl.handle.net/10356/69489 |
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| Institution: | Nanyang Technological University |
| Language: | English |