Design and implementation of automated buffer cycling for applied material (AMAT) chemical vapor deposition (CVD) process producer tool
In the semiconductor manufacturing industry, qualification of the tool is the most important thing to do before the tool is being released to run for production. By doing that, the desired quality and specification of the product is achieved. The tool qualification is need to be done whenever the to...
Saved in:
Main Author: | Lin, Htein |
---|---|
Other Authors: | Shum Ping |
Format: | Final Year Project |
Language: | English |
Published: |
2018
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/76319 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
CHEMICAL VAPOR DEPOSITION (CVD) GRAPHENE-BASED COATING SYSTEM FOR PREVENTION OF BIOMEDICAL DEVICE-RELATED INFECTIONS ASSOCIATED WITH BIOFILMS
by: ZHU XIAO
Published: (2023) -
Growth and characterization of germanium expitaxial film on silicon (001) using reduced pressure chemical vapor deposition (RP-CVD)
by: Tan, Yew Heng.
Published: (2013) -
Synthesis and characterization of two-dimensional (2D) boron-carbon-nitrogen (BCN) hybrids by chemical vapor deposition (CVD)
by: Ang, Soon Loong
Published: (2014) -
SOLUTION-PROCESSABLE AND TRANSFERRED CHEMICAL VAPOUR DEPOSITION (CVD) GRAPHENE
by: KAM FONG YU
Published: (2015) -
Chemical vapor deposition growth of graphene
by: Fang, Wenjing
Published: (2013)