Study of copper suicide retardation effects on copper diffusion in silicon

Study of copper suicide retardation effects on copper diffusion in silicon

10.1063/1.1343518

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Bibliographic Details
Main Authors: Lee, C.S., Gong, H., Liu, R., Wee, A.T.S., Cha, C.L., See, A., Chan, L.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113104
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/113104

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