Study of copper suicide retardation effects on copper diffusion in silicon

10.1063/1.1343518

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Bibliographic Details
Main Authors:	Lee, C.S., Gong, H., Liu, R., Wee, A.T.S., Cha, C.L., See, A., Chan, L.
Other Authors:	INSTITUTE OF ENGINEERING SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113104
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Institution:	National University of Singapore

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