Study of copper suicide retardation effects on copper diffusion in silicon
10.1063/1.1343518
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Main Authors: | Lee, C.S., Gong, H., Liu, R., Wee, A.T.S., Cha, C.L., See, A., Chan, L. |
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Other Authors: | INSTITUTE OF ENGINEERING SCIENCE |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/113104 |
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Institution: | National University of Singapore |
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