Study of copper suicide retardation effects on copper diffusion in silicon

Study of copper suicide retardation effects on copper diffusion in silicon

10.1063/1.1343518

Saved in:
Bibliographic Details
Main Authors: Lee, C.S., Gong, H., Liu, R., Wee, A.T.S., Cha, C.L., See, A., Chan, L.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113104
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1063/1.1343518

Similar Items