Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon

Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon

10.1063/1.3264572

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書目詳細資料
Main Authors:	Dingemans, G., Engelhart, P., Seguin, R., Einsele, F., Hoex, B., Van De Sanden, M.C.M., Kessels, W.M.M.
其他作者:	SOLAR ENERGY RESEARCH INST OF S'PORE
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/113251
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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