Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)

Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)

10.1109/SPI.2002.258309

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Main Authors: Loh, S.W., Zhang, D.H., Liu, R., Li, C.Y., Wee, A.T.S.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/116127
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1161272015-02-04T02:49:52Z Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA) Loh, S.W. Zhang, D.H. Liu, R. Li, C.Y. Wee, A.T.S. INSTITUTE OF ENGINEERING SCIENCE PHYSICS 10.1109/SPI.2002.258309 Proceedings - 6th IEEE Workshop on Signal Propagation on Interconnects, SPI 177-180 2014-12-12T07:36:40Z 2014-12-12T07:36:40Z 2002 Conference Paper Loh, S.W.,Zhang, D.H.,Liu, R.,Li, C.Y.,Wee, A.T.S. (2002). Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA). Proceedings - 6th IEEE Workshop on Signal Propagation on Interconnects, SPI : 177-180. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/SPI.2002.258309" target="_blank">https://doi.org/10.1109/SPI.2002.258309</a> 0780398211 http://scholarbank.nus.edu.sg/handle/10635/116127 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1109/SPI.2002.258309
author2 INSTITUTE OF ENGINEERING SCIENCE
author_facet INSTITUTE OF ENGINEERING SCIENCE
Loh, S.W.
Zhang, D.H.
Liu, R.
Li, C.Y.
Wee, A.T.S.
format Conference or Workshop Item
author Loh, S.W.
Zhang, D.H.
Liu, R.
Li, C.Y.
Wee, A.T.S.
spellingShingle Loh, S.W.
Zhang, D.H.
Liu, R.
Li, C.Y.
Wee, A.T.S.
Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)
author_sort Loh, S.W.
title Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)
title_short Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)
title_full Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)
title_fullStr Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)
title_full_unstemmed Study of copper diffusion into tantalum nitride (Ta2N) by rapid thermal annealing (RTA)
title_sort study of copper diffusion into tantalum nitride (ta2n) by rapid thermal annealing (rta)
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/116127
_version_ 1681095109524848640

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