Effects of first rapid thermal annealing temperature on Co silicide formation

Effects of first rapid thermal annealing temperature on Co silicide formation

10.1016/S0038-1101(03)00008-X

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Bibliographic Details
Main Authors: Peng, H.J., Shen, Z.X., Lim, E.H., Lai, C.W., Liu, R., Wee, A.T.S., Sameer, A., Dai, J.Y., Zhang, B.C., Zheng, J.Z.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/116312
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/116312

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